专利名称：CLOSED LOOP CONTROL发明人：DEPPISCH, Thomas,HELLE, Franz-Josef,ENGLERT, Manfred,HERMANNS, Uwe
申请号：EP11796945.1申请日：20111130公开号：EP2785892A1公开日：20141008
摘要：A method of controlling a reactive deposition process and a correspondingassembly and/or apparatus are described. The method includes providing power to acathode with a power supply, providing a voltage set point to the power supply, receivinga power value correlating the power provided to the cathode, and controlling a flow of aprocess gas in dependence of the power value to provide a closed loop control for thepower value.
申请人：Applied Materials, Inc.
地址：3050 Bowers Avenue Santa Clara, CA 95054 US
国籍：US
代理机构：Zimmermann & Partner
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